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Ni1000SOT£ºThe measurement of temperature is for many applications the most important measurement for safety and reliability of systems. Ni-thin film Resistance Temperature Detectors (Ni-RTD¡äs) are manufactured by PVD-deposition on silicon substrate. In the next step the resistance meander is photolithographically structured by wet chemical etching and finally the thin film structure is covered by a passivation layer for environmental protection. Finally these chips are diced and mounted on the lead frame in the SOT23 package. This technology allows producing very small size, low cost, high precision and long term stable temperature sensors.

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